Opto Diode, a division of ITW, headquartered in Camarillo, California, is exhibiting at SPIE Photomask Technology + Extreme Ultraviolet Lithography 2026, held September 8–11, 2026, in Monterey, California. Visit our team at booth 502 during the exhibition, open September 9–10.

The annual SPIE conference gathers scientists and engineers working across photomasks, patterning, metrology, materials, inspection and repair, mask business, and extreme ultraviolet lithography — the community that builds and qualifies the mask and EUV infrastructure behind advanced semiconductor manufacturing.

What we’re bringing to Monterey

Opto Diode manufactures photodiodes purpose-built for this field. At booth 502 we will be discussing:

• SXUV series EUV photodiodes (1–190 nm) — detectors with high radiation hardness for EUV lithography applications, including the SXUV100TF135 filtered EUV photodiode for 13.5 nm detection, and the full lineup on our SXUV product page.
• AXUV series detectors — used for electron reticle inspection, electron detection, and synchrotron radiation monitoring; see the AXUV product line.
• Custom photodiode designs for OEM lithography, metrology, and inspection systems, built in our Camarillo, California facility.

If you’re deciding between deep-UV and extreme-UV detection approaches, our guide to the difference between EUV and DUV is a good place to start before the show.

Registration

Register for SPIE Photomask Technology + Extreme Ultraviolet Lithography on SPIE.org — the two-day exhibition (September 9–10) is free to attend. To arrange a conversation with our engineers at the show, contact us before the event.

Published September 1, 2026.